The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 1993
Filed:
Dec. 11, 1990
Applicant:
Inventors:
AnnMarie Hellstern, Clifton Park, NY (US);
Robert J Halley, Schenectady, NY (US);
Linda L Mitchell, Delmar, NY (US);
I-Chung W Wang, Vienna, WV (US);
Assignee:
General Electric Company, Schenectady, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L / ;
U.S. Cl.
CPC ...
525 66 ; 525 63 ; 525426 ; 525431 ;
Abstract
The impact resistance of polyimides is improved by the addition of impact modifiers comprising, as a first stage, an elastomeric polydiorganosiloxane optionally polymerized simultaneously with but separately from one or more vinyl monomers, and as at least one grafted subsequent stage a polymer or copolymer of acrylonitrile, methacrylonitrile, a vinyl aromatic compound, (meth)acrylic acid, alkyl (meth)acrylate or (meth)acrylamide monomer.