The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 1993
Filed:
Dec. 27, 1990
Applicant:
Inventor:
Xiahhui Ning, N. Providence, RI (US);
Assignee:
American Optical Corporation, Southbridge, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B / ; G02F / ; G03H / ;
U.S. Cl.
CPC ...
359-3 ; 359 15 ; 359330 ; 430-1 ;
Abstract
A new method for making holographic notch filters in the near infrared spectral region is disclosed. This method utilizes lthe nonlinearity in the response function of holographic materials. When a holographic medium is exposed to two laser beams at different wavelengths, the nonlinearity in the response function causes the formation of notch reflections at wavelengths corresponding to the sum and difference frequencies of the exposing beams. The notch at the difference frequency can be in the NIR region by properly choosing the exposure wavelengths. This method is applicable to holographic filters on both flat and curved substrates.