The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 30, 1993

Filed:

Jun. 07, 1991
Applicant:
Inventors:

Brian C Benicewicz, Los Alamos, NM (US);

Andrea E Hoyt, Los Alamos, NM (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07D / ;
U.S. Cl.
CPC ...
548435 ; 525282 ; 525432 ; 526262 ; 528310 ; 528322 ;
Abstract

The present invention provides (1) curable polyamide monomers represented by the formula: R.sup.1 -A.sup.1 -B.sup.1 -A.sup.2 -B.sup.2 -A.sup.3 -R.sup.2 where R.sup.1 and R.sup.2 are radicals selected from the group consisting of maleimide, substituted maleimide, nadimide, substituted nadimide, ethynyl, and (C(R.sup.3).sub.2).sub.2 where R.sup.3 is hydrogen with the proviso that the two carbon atoms of (C(R.sup.3).sub.2).sub.2 are bound on the aromatic ring of A.sup.1 or A.sup.3 to adjacent carbon atoms, A.sup.1 and A.sup.3 are 1,4-phenylene and the same where said group contains one or more substituents selected from the group consisting of halo, e.g., fluoro, chloro, bromo, or iodo, nitro, lower alkyl, e.g., methyl, ethyl, and propyl, lower alkoxy, e.g., methoxy, ethoxy, or propoxy, and fluoroalkyl or fluoroalkoxy, e.g., trifluoromethyl, pentafluoroethyl and the like, A.sup.2 is selected from the group consisting of 1,4-phenylene, 4,4'-biphenyl, 2,6-naphthylene and the same where said groups contain one or more substitutents selected from the group consisting of halo, e.g., fluoro, chloro, bromo, or iodo, nitro, lower alkyl, e.g., methyl, ethyl, and propyl, lower alkoxy, e.g., methoxy, ethoxy, or propoxy, and fluoroalkyl or fluoroalkoxy, e.g., trifluoromethyl, pentafluoroethyl and the like, and B.sup.1 and B.sup.2 are selected from the group consisting of --C(O)--N(H)-- and --N(H)--C(O)--, (2) thermoset polyamide compositions comprised of cured segments derived from monomers represented by the formula: R.sup.1 -A.sup.1 -B.sup.1 -A.sup.2 -B.sup.2 -A.sup.3 -R.sup.2 as described above, and curable blends of at least two of the polyamide monomers and (4) processes of preparing the curable polyamide monomers.


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