The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 1993
Filed:
Jul. 31, 1991
John S Foster, Morgan Hill, CA (US);
Kurt A Rubin, Santa Clara, CA (US);
Jaquelin K Spong, Mountain View, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
The method to detect and determine the profile of the material property or the structure changes not only on surface but also at the subsurface, of a storage medium or a scanned sample. This method comprises the following steps: (a), a nondestructive periodic or modulated perturbation is applied to the sample to be scanned. (b) the perturbed sample is then scanned using a microprobe, e.g., scanning tunneling microscopy (STM) or atomic force microscopy (AFM), which is responsive to the applied periodic or modulated perturbations and (c) the modulated output signals from the microprobe, in combination with the input perturbation signals, are processed and demodulated to automatically control the motion of the probe, and to determine the profiles of the material properties or the structure changes of the scanned sample.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile