The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 1993
Filed:
May. 28, 1991
Applicant:
Inventor:
Ken Soda, Chicago, IL (US);
Assignee:
Tru Vue, Inc., Chicago, IL (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C03C / ;
U.S. Cl.
CPC ...
156631 ; 156663 ;
Abstract
A process is disclosed for simultaneously etching only one side of at least two sheets of glass to reduce specular reflectance on the etched side while improving resolution and process efficiency. In the process, two face to face sheets of glass are aligned and a seal is formed to render the adjacent inside faces of the glass sheets substantially fluid-tight during the etching process. The sealed sheets are then transferred to an etching bath where their outside faces are etched, but their inside faces are not visibly etched.