The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 1993
Filed:
Apr. 27, 1992
Akifumi Nakashima, Ichinomiya, JP;
Broher Kogyo Kabushiki Kaisha, Nagoya, JP;
Abstract
When a desired stitch pattern is selected by the operator, stitch pattern data representing the desired stitch pattern and image data representing the image of the stitch pattern to be projected on a workpiece are stored temporarily in a RAM. When the push button of a frame shifting switch is depressed, an embroidery frame holding the workpiece is shifted from a stitching area to an image projecting area. The image of the stitch pattern can be projected without being obstructed by the needle bar, the needle and the presser foot on the workpiece held by the embroidery frame placed in the image projecting area, so that the operator is able to confirm the stitch pattern to be formed easily and correctly. A projector projects the full-sized image of the stitch pattern on the basis of the image data read from the RAM on the workpiece held by the embroidery frame. The position of the embroidery frame relative to a reference position in the image projecting area can be changed by operating frame position adjusting switches to determine the position of the stitch pattern to be formed on the workpiece. The stitch pattern is formed on the workpiece at the position determined by operating the frame position adjusting switches in the image projecting area in forming the stitch pattern on the workpiece held by the embroidery frame placed in the stitching area.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile