The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 1993
Filed:
Dec. 24, 1991
Michael C Cates, Solana Beach, CA (US);
Richard R Hamm, San Diego, CA (US);
Maxwell Laboratories, Inc., San Diego, CA (US);
Abstract
The present invention provides an automated system and method for removing one or more layers of a material from a substrate. The system and method include irradiating a structure comprising at least one layer of material formed on a substrate with a light beam having an intensity sufficient to ablate the materials in order to expose selected regions of the substrate, where the ablated material generates photoacoustic signature signals; scanning the structure with the light beam along a predetermined path at a scan speed; detecting the photoacoustic signature signals; determining an updated scan speed functionally related to the detected photoacoustic signals; and directing the scan speed to be equal to the updated scan speed. Another embodiment exposes a selected layer of a multilayered structure in a process which includes irradiating the surface of multilayered structure at a first location with a light beam having sufficient intensity to ablate the irradiated layer and generate photoacoustic pressure wave signals; detecting the photoacoustic pressure wave signals generated at the irradiated surface; comparing representations of the photoacoustic pressure wave signals with a reference value corresponding to a photoacoustic signature signal of a layer of the structure selected to be exposed; and directing the light source to scan the surface of the structure at a scan speed functionally related to the difference between the photoacoustic pressure wave signals and the reference value.