The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 1993
Filed:
Jun. 05, 1990
Christian Le Sergent, Marcoussis, FR;
Compagnie Generale D'Electricite, Paris Cedex, FR;
Abstract
Method of outside plasma deposition onto a rod (17,22) of silica substantially free from hydroxyl ions, possibly doped to change its refractive index, by reaction with oxygen of a silicon compound and possibly of doping compounds, in the presence of a gas plasma raised to a very high temperature (16) by induction with the help of a high frequency generator (15). The rod on which the silica deposit is made is kept in a sealed chamber (19) separated from the surrounding atmosphere and supplied by a pipe (20) with atmospheric air that is successively passed through a filter (31), a compressor (32) a cooling means (33), a condensation water drain (35) and a final desiccation by adsorption (36, 38). A device for implementing the method is also claimed.