The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 1993
Filed:
Mar. 04, 1992
Bradley W Scheer, San Jose, CA (US);
Paul A Konicek, Santa Clara, CA (US);
VLSI Standards, Inc., Mountain View, CA (US);
Abstract
A particle deposition system having an atomizer, wafer transport, sheath flow means, particle counter and computer control for accurately depositing a desired density of particles onto a surface. The sheath flow keeps an article clean, while the particle flux in the deposition chamber is rising from zero to an equilibrium state. The particle counter measures particle flux by sampling the atmosphere in the deposition chamber. The computer determines when the rate of change of particle flux is substantially zero and then actuates transport of the article completely or partially out of the sheath flow into the mist of falling particles. The computer also calculates the required deposition time for providing the article's surface with a desired particle density, actuating transport of the article back into the sheath flow after the desired density is reached. The operator of the system can specify particle size, desired density and full or partial coverage of the surface with particles. The particles can be polystyrene latex reference spheres or real contaminant types for use in calibration wafers for surface scanners.