The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 1993
Filed:
Aug. 16, 1991
Applicant:
Inventor:
Robert L Anderson, Palo Alto, CA (US);
Assignee:
Varian Associates, Inc., Palo Alto, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20419212 ; 20429818 ; 20429819 ; 2042982 ;
Abstract
A source for sputtering from concentric rings on the surface of a single target is shown. The source comprises a rotatable closed-loop magnet having a plurality of curved sections of different average radius interconnected by a equal number of radial sections. In the preferred embodiment the curved sections each have a shape which results in a predetermined erosion profile in the associated concentric ring of the sputter target. The relative rate of sputtering from each of the rings may be controlled by adjusting the relative lengths of the curved portions of the closed-loop magnet.