The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 16, 1993

Filed:

Dec. 18, 1991
Applicant:
Inventors:

Volker Liedke, Elsenfeld/Eichelsbach, DE;

Karl-Heinz Grasmann, Stadtprozelten, DE;

Hans-Jurgen Albrecht, Berlin, DE;

Harald Wittrich, Berlin, DE;

Wilfred John, Berlin, DE;

Wolfgang Scheel, Berlin, DE;

Assignee:

WLS Karl-Heinz Grasmann, Faulbach, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23K / ; B08B / ;
U.S. Cl.
CPC ...
228205 ; 228206 ; 134 19 ; 134 31 ;
Abstract

In the process according to the invention for soldering electronic boards, in particular, printed circuit boards with devices installed on them, first, during the pickling process, a condensable process material, for example, water, is introduced into flaws in the oxide layers on the soldering connection surfaces and at least partially condensed in the flaws. Then, the oxide layers are exposed to rapid heating such that the process material condensed in the flaws vaporizes explosively and thus the oxide layer breaks up and cracks off of the basis material, such that the soldering connection surfaces for the subsequent actual soldering process are brought to virgin condition. In the case of wave soldering, the rapid heating occurs preferably by means of the wave of solder itself. If non-oxide passive layers must also be removed, this occurs preferably in a preceding stage of the pickling process, during which the oxide layer is hydrophilized. For this, a plasma pretreatment is suitable. The device according to the invention has a moisturizing chamber in which the condensable process material is supplied to the hydrophilic oxide layers and absorbed by them.


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