The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 1993
Filed:
Mar. 29, 1991
Johannes A Bernsen, Eindhoven, NL;
Seiji Kashioka, Tokyo, JP;
U.S. Philips Corporation, New York, NY (US);
Hitachi, Ltd., Tokyo, JP;
Abstract
In a detecting patterns in data arranged in a spatial field of one, two or higher dimension, a pattern contrast signal is evaluated which measures the similarity to the pattern of the data around a location in the spatial field. The pattern is subsequently detected if the pattern contrast signal is sufficiently strong. There is, however, a risk of erroneous detection when a coincidental noise configuration causes an increased pattern contrast signal. The invention provides for a method and apparatus to discriminate against such erroneous detections. For this purpose, the method observes the extent to which a would-be pattern dominates the effect on the pattern contrast signal of the distribution of data values in the surroundings of the location, this distribution being taken to be typical of noise. In one embodiment, this is done by confirming that the pattern is sufficiently strong to suppress any other would-be pattern detections in the surroundings. In another embodiment, this is done by confirming that the pattern contrast signal responds as expected in the noise free case when the spatial field is rescaled around the location before evaluating the pattern contrast signal.