The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 1993
Filed:
Nov. 18, 1991
Samsung Electronics Co., Ltd., Suweon, KR;
Abstract
A BICMOS device and manufacturing method wherein the gates of PMOS and NMOS transistors are formed by forming a first polysilicon layer which is not implanted by an impurity and forming a second polysilicon layer on the first polysilicon layer which is impurity implanted, so that the impurity doped in the second polysilicon layer is prevented from diffusing into the channel region and the voltage characteristic is prevented from changing. Emitter regions of vertical PNP and NPN bipolar transistors are self-aligned in a small chip area, and thereby the performance of the BICMOS device is improved due to the stable threshold voltage characteristic of the PMOS and NMOS transistors and high density is achieved together with improved operation speed clue to the self-alignment formation of the emitter region of the vertical PNP and NPN bipolar transistors.