The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 1993
Filed:
Aug. 23, 1991
Koji Kawai, Hamamatsu, JP;
Yuji Shimazu, Hamamatsu, JP;
Hamamatsu Photonics K.K., Shizuoka, JP;
Abstract
A gas discharge tube having an outer envelope in which deuterium gas is filled. In the envelope, an anode, a cathode and a first shield cover for surrounding these electrodes are disposed. A second shield cover is disposed within the first shield cover and at a position adjacent the anode to divide an internal space defined by the first shield cover into a first chamber in which the anode is positioned and a second chamber in which a cathode is positioned. A plasma arc generating portion is positioned at the second shield cover. A plasma arc generated on the plasma arc generating portion provides an optical axis extending linearly toward the outer envelope through an opening of the first shield cover. The cathode is disposed at a position offset from the optical axis for providing a flow line of electrons from the cathode to the anode in a direction obliquely with respect to the optical axis. A shield member is further provided at a position immediately adjacent the plasma arc generating portion for largely bending the flow line of the electrons at a tip end portion of the shield member and for directing the flow line substantially coincident with the optical axis.