The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 1993
Filed:
Mar. 25, 1992
Kazutoshi Higashiyama, Hitachi, JP;
Takahisa Ushida, Nagoya, JP;
Izumi Hirabayashi, Nagoya, JP;
Shoji Tanaka, Tokyo, JP;
Hitachi, Ltd., Tokyo, JP;
NGK Spark Plug Co., Ltd., Aichi, JP;
International Superconductivity Technology Center, Tokyo, JP;
Abstract
An apparatus for producing a superconducting oxide film with stable properties by metal organic chemical vapor deposition, suitable for mass production, is provided with a gas analyzer comprising a differential pressure meter 38 between a raw material gas collector tube 35 provided in a transfer line 8 for leading a raw material gas to a film forming chamber 10 and a bypass line 37, a dilution gas line 49 interlocked with the differential pressure meter 38 and for leading a dilution gas to the raw material gas collector tube 35, a gas separation column 42 branched from the bypass line, a gas detector 31 connected to the gas separation column 42, flow rate controllers 50 for carrier gases 43 and 45 and a thermostat 13 for heating all the lines. Amounts of raw materials gases can be readily measured and controlled and thus superconducting oxide films of stable properties in a constant metal composition ratio can be continuously produced, and thus the present apparatus is suitable for mass production of tape form, superconducting materials.