The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 1993
Filed:
Oct. 26, 1990
Brother Kogyo Kabushiki Kaisha, Nagoya, JP;
Abstract
An apparatus for processing embroidery data utilized by a sewing machine for embroidering areas by filling the areas with stitches, including a storing device storing, for each of the area, sets of position data representative of defining points which cooperate with each other to define the each area, a selecting device selecting, based on the sets of position data for the areas, one of pairs of the defining points belonging to successive two of the areas one of which precedes the other area in an order of embroidering of the areas which pairs result from combining a particular defining point belonging to a first group consisting of the defining points defining one of the successive two areas, with each of defining points which belong to a second group consisting of the defining points defining the other of the successive two areas and which satisfy a predetermined requirement, such that a distance between the two defining points of the selected pair is the smallest of the pairs, and a determining device determining one of the two defining points of the selected pair which one point belongs to the preceding one of the successive two areas, as an end position of the embroidering of the preceding one area, and the other defining point of the selected pair as a start position of the embroidering of the other area of the successive two areas.