The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 1993
Filed:
Sep. 24, 1990
Ryohei Itatani, Kyoto, JP;
Kazuyuki Fukumoto, Sodegaura, JP;
Idemitsu Petrochemical Company Limited, Tokyo, JP;
Abstract
A microwave plasma generating apparatus for generating plasma by radiating microwave into a space in which electric discharge takes place contains a plurality of microwave radiating means for radiating a plurality of microwaves having different directions of electric fields from each other. This microwave plasma generating apparatus can produce a diamond thin film by exciting a carbon source gas supplied into the space and bringing the excited gas into contact with a substrate to be formed thereon with the diamond thin film, the substrate being disposed in the space in which the electric discharge is performed. This apparatus can produce a large volume of plasma in a stable fashion and, as a result, provide a diamond thin film in a large area as a whole.