The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 1993
Filed:
Apr. 22, 1991
Applicant:
Inventors:
Yoshiharu Maezawa, Shiga, JP;
Norimoto Nouchi, Katano, JP;
Assignee:
Matsushita Electric Industrial Co., Ltd., Kadoma, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427132 ; 427130 ; 4272481 ; 427250 ; 4272551 ; 427294 ; 427295 ; 427348 ; 427349 ; 427377 ;
Abstract
In a method for manufacturing a functional thin film by a vacuum evaporation method, during a thin film containing a material is evaporation-deposited on a substrate, a gas flow controls orientation of the material in a manner that the gas flow substantially intersects direction of flow of vapor of said material onto the substrate.
Maezawa, Yoshiharu. (1993). Method for manufacturing functional thin film (U.S. Patent No. 5186977). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5186977
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile