The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 09, 1993

Filed:

Jun. 18, 1991
Applicant:
Inventors:

Stanley N Lapidus, Bedford, NH (US);

Dean Kamen, Bedford, NH (US);

Richard R Villeneuve, Bedford, NH (US);

Lewis T Polk, Jr, Bedford, MA (US);

Assignee:

Cytyc Corporation, Marlborough, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D / ;
U.S. Cl.
CPC ...
210741 ; 210 90 ; 210 97 ; 210808 ; 422 81 ; 422101 ; 73 6147 ; 436177 ;
Abstract

A method and apparatus for the controlled instrumentation processing of cells and other paricles with a filter device measures a parameter of the flow through the filter device of a fluid carrying the particles. A measure of the change of fluid flow through the filter device yields desired information for quantizing the particles and for quantizing the obstruction of the filter device by the particles. The method and apparatus typically operate automatically.


Find Patent Forward Citations

Lapidus, Stanley. (1993). Method and apparatus for control of flow through a filter chamber by (U.S. Patent No. 5185084). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5185084

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…