The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 1993
Filed:
Sep. 10, 1991
Kazuaki Kondo, Kawasaki, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
A method for fabricating an exposure mask includes steps of: forming a layered body comprising a substrate, a membrane transparent to an X-ray and provided on the upper major surface of the substrate, and an X-ray absorbing film provided on the membrane; adhering a support ring on a lower major surface of the substrate; carrying out etching on an area on the lower major surface of the substrate until a lower major surface of the membrane is exposed, the area corresponding to an inside of the support ring block; and patterning the X-ray absorbing film into a desired semiconductor pattern. The step of adhering the substrate to the support ring includes steps of placing an adhesive layer between a lower major surface of the layered body and the upper major surface of the support ring; and adhering the layered body to the support ring by applying a gas pressure on an upper major surface of the layered body so that the layered body is pressed via the adhesive layer against the support ring and adhered thereto by the adhesive layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile