The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 1993
Filed:
May. 30, 1990
Tadashi Ichihashi, Tokyo, JP;
Koichi Akiyama, Tokyo, JP;
Kowa Company Limited, , JP;
Abstract
An ophthalmic measurement apparatus is provided in which a laser beam is converged at a selected point in a measurement zone within an eye and light scattered therefrom is photoelectrically detected via a measurement mask having an aperture of a prescribed size for ophthalmic measurement. During alignment the measurement zone is scanned at high speed by the laser beam with the same scanning width as the scanning width used during measurement. This makes it possible to observe any harmful light rays that will actually appear during measurement at those settings and to align the apparatus so that the harmful light rays do not come within the limiting aperture of the measurement mask, thereby enabling measurement to be conducted under optimum conditions.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile