The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 02, 1993

Filed:

Oct. 15, 1991
Applicant:
Inventors:

Jon J Harper, Naperville, IL (US);

George E Kuhlmann, Naperville, IL (US);

Keith D Larson, Chicago, IL (US);

Rosemary F McMahon, Wheaton, IL (US);

Paul A Sanchez, Lisle, IL (US);

Assignee:

Amoco Corporation, Chicago, IL (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07C / ;
U.S. Cl.
CPC ...
562414 ; 502 28 ; 556 49 ; 556147 ; 562416 ; 562417 ; 562487 ; 562488 ;
Abstract

Provided is a continuous process for producing 2,6-naphthalenedicarboxylic acid by the liquid phase oxidation of 2,6-dimethylnaphthalene comprising continuously adding to a reaction zone the oxidation reaction components comprising 2,6-dimethylnaphthalene, a source of molecular oxygen, a solvent comprising an aliphatic monocarboxylic acid, and a catalyst comprising cobalt, manganese and bromine components, wherein the atom ratio of manganese to cobalt is about 5:1 to about 0.3:1, the total of cobalt and manganese is at least about 0.40 weight percent based on the weight of solvent, and maintaining the contents of the reaction zone at a temperature of about 370.degree. F. to about 420.degree. F. and at a pressure sufficient to maintain at least a portion of the monocarboxylic acid in the liquid phase thereby oxidizing the 2,6-dimethylnaphthalene to 2,6-naphthalenedicarboxylic acid. By operating according to the process of this invention, 2,6-naphthalenedicarboxylic acid can be continuously produced in high yield and with low levels of impurities.


Find Patent Forward Citations

Loading…