The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 1993
Filed:
Oct. 28, 1991
Applicant:
Inventors:
Akira Yamaguchi, Hyogo, JP;
Masaru Uno, Hyogo, JP;
Norio Sekikawa, Tokyo, JP;
Fumio Arai, Tokyo, JP;
Kenji Matsuzaki, Tokyo, JP;
Assignee:
Sumitomo Seika Chemicals Co., Ltd., Hyoga, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D / ;
U.S. Cl.
CPC ...
55 34 ; 55 68 ; 55390 ;
Abstract
An improved process for recovery of CO.sub.2 gas in a raw material mixed gas by a PSA apparatus. The process is characterized in that the removal of water in the raw material mixed gas is carried out by cooling the raw material mixed gas and passing it through a rotary dehumidification apparatus to remove water in the raw material mixed gas, and the regeneration of the rotary dehumidification apparatus is carried out by using as a gas for regeneration unadsorbed gas discharged from an adsorption step in the PSA apparatus with heating.