The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 1993
Filed:
Jul. 15, 1991
Tadao Okada, Yokkaichi, JP;
Hajime Ikeno, Yokkaichi, JP;
Yuji Ozeki, Yokkaichi, JP;
Yoshikazu Higaki, Yokkaichi, JP;
Koshi Matsubara, Yokkaichi, JP;
Kenichi Nakamura, Kashima, JP;
Mitsubishi Petrochemical Company, Ltd., Tokyo, JP;
Abstract
A copolymer is manufactured by allowing ethylene (A) and vinyl compounds (B) represented by the following general formula to undergo radical polymerization at a pressure of 1000-5000 kg/cm.sup.2 and a temperature of 100.degree.-400.degree. C., ##STR1## wherein R.sub.1 and R.sub.2 are each an independent hydrogen atom or a methyl group, R.sub.3 is a hydrogen atom or an alkyl group of 1-4 carbon atoms; a ratio of (B) to the sum of (A) and (B) is less than 1 mol %; a proportion of the amount of vinyl compounds (B), which are not successively bonded at all to the units (B) in the chain, but bonded to unlike units (A) on both sides thereof, to the total amount of (B) units in the copolymer is at least a 83%; and an MFR of the copolymer ranges from 0.1 to 200 g/10 min. Although the copolymer contains only a small amount of the vinyl compound (B) it nevertheless has excellent photo stabilizing effects.