The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 19, 1993

Filed:

Mar. 22, 1991
Applicant:
Inventors:

Shinji Furukawa, Kyoto, JP;

Kazuki Oka, Kyoto, JP;

Akira Tanimura, Kyoto, JP;

Assignee:

Unitika, Ltd., Hyogo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G08B / ;
U.S. Cl.
CPC ...
340551 ; 148100 ; 2041921 ; 340572 ; 428900 ;
Abstract

A thin-film magnetic material is formed on a polymer substrate. The material exhibits large Barkhausen discontinuity without intentional application of external tensile or torsional stress. The thin-film material may be produced by a sputtering technique wherein the normal to the substrate is directed obliquely to a target member. A biasing magnetic field in proximity to the substrate may also be used during film formation, and the substrate may be supported by a curved holder or a cylindrical roll-to-roll apparatus. The thin-film thus produced may be used as a marker in an article surveillance system or as a magnetic sensor.


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