The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 1993
Filed:
Apr. 22, 1991
Applicant:
Inventors:
Frank W Mercer, Belmont, CA (US);
Timothy D Goodman, Redwood City, CA (US);
Aldrich N Lau, Palo Alto, CA (US);
Lanchi P Vo, San Jose, CA (US);
Assignee:
Raychem Corporation, Menlo Park, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C08G / ; C08G / ;
U.S. Cl.
CPC ...
528219 ; 20415763 ; 20415792 ; 4284111 ; 522181 ; 525390 ; 526247 ; 526262 ; 526279 ; 528 32 ; 528170 ; 528205 ; 528216 ;
Abstract
Fluorinated polyether compositions having reactive end gorups, such as ##STR1## can be crosslinked to produce cured films useful as dielectrics for microelectronic applications. Other reactive end groups such as allyl, benzocyclobutyl, N-phenylmaleimido, alkynylphenyyl, styryl, allylphenyl, cyanophenyl, and triazenophenyl are also suitable.