The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 1993
Filed:
Jan. 18, 1990
Applicant:
Inventors:
Masao Yamada, Yokohama, JP;
Kazuaki Kondo, Sagamihara, JP;
Assignee:
Fujitsu Limited, Kawasaki, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ; 378 35 ;
Abstract
A method of manufacturing an X-ray exposure mask comprises steps of forming a membrane including a layer of crystalline silicon carbide on a silicon substrate, processing a top surface of the membrane such that the top surface becomes a mirror-flat top surface, depositing a layer of X-ray absorbing material on the mirror-flat top surface of the membrane, and patterning the layer of the X-ray absorbing material according to a desired semiconductor pattern.
Yamada, Masao. (1993). Manufacturing method of an x-ray exposure mask (U.S. Patent No. 5178977). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5178977
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile