The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 12, 1993

Filed:

Oct. 23, 1990
Applicant:
Inventors:

Marshall I Gurian, Tempe, AZ (US);

James R Carter, Tempe, AZ (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D / ;
U.S. Cl.
CPC ...
210403 ; 210394 ; 210407 ; 2104161 ;
Abstract

A method for removing a liquid stripper composition from a slurry comprised of the liquid stripper composition and of photoresist film particles which were removed from a circuit board substrate by using the liquid stripper composition. The slurry flows over the inner surface of the porous wall of a drum under gravity to form a generally uniform layer on the inner surface of the drum. Liquid escapes from the slurry through the porous wall of the drum.


Find Patent Forward Citations

Gurian, Marshall. (1993). Filtration system to remove photoresist film particles (U.S. Patent No. 5178759). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5178759

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…