The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 1993
Filed:
Sep. 12, 1991
Kiyoshi Yoshikawa, Kawasaki, JP;
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
A semiconductor substrate etching apparatus for etching a tapered outer circumferential surface of a semiconductor substrate. A semiconductor substrate supply unit, an X-Y stage unit, an etchant applying unit, a cleaning unit, a baking unit, and a semiconductor substrate recovering unit are arranged in a horizontal plane in the described order. Semiconductor substrates are sequentially transferred by a transfer mechanism from the semiconductor substrate supply unit to the semiconductor substrate recovering unit in the described order. A control unit controls the transfer mechanism to perform the transferring of the semiconductor substrate, and controls the X-Y stage unit in response to a position detection signal, outputted from a position detector, for positioning the semiconductor substrate on the X-Y stage unit.