Laser-assisted chemical vapor deposition

Abstract

An apparatus for performing laser-assisted deposition of material on a target surface includes a reaction chamber enclosure having a window therein. The reaction chamber is partially evacuated, and a reactive gas is introduced into the reaction chamber enclosure. A laser directs a laser beam into the interior of the reaction chamber enclosure through the window, and the laser beam causes the reactive gas to react to produce an ionized reaction product gas. Optionally, a catalyst is provided within the reaction chamber enclosure to catalyze this reaction. The ionized gaseous reaction product flows from the interior of the reaction chamber enclosure toward a target surface through a nozzle opening in a wall of the reaction chamber enclosure. A voltage is applied between an electrode in the interior of the reaction chamber enclosure and the target surface to accelerate the ionized reaction product out the nozzle and toward the target surface. The ambient atmosphere in the region of the target surface is controlled by a shroud or an environmental control chamber, to assist in the deposition of the ionized reaction product on the target surface. A further reactive gas may be introduced into the vicinity of the target surface, for deposition of compounds onto the target surface through reaction with the ionized reaction product.