The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 1992
Filed:
Apr. 27, 1990
Tsutomu Uezono, Sagamihara, JP;
Akihiro Watanabe, Neyagawa, JP;
Mitsushi Kuroki, Kumamoto, JP;
Toshio Nishino, Nara, JP;
Shoji Tomita, Yao, JP;
Mita Industrial Co., Ltd., Osaka, JP;
Abstract
A developing process excellent in the reproducibility of images is disclosed. In reproducing multiple fine lines, the line width can be kept uniform in the respective lines and front end chipping or rear end chipping can be prevented, and a high-density and high-quality image can be formed, by comprehensively setting developing conditions so that the relaxation time measured under dynamic conditions in an electric circuit comprising a developing sleeve, a surface of a photosensitive material and a developing layer interposed therebetween is set within a certain range; carrying out the sliding contact between the magnetic brush of the developer and the surface of the photosensitive material so that the frequency of the contact of a carrier with the photosensitive material is set within a certain range; or establishing a specific relation among the rotation number of the developing sleeve, the saturation magnetization of the magnetic carrier and the flux density of magnetic poles in the developing sleeve or further setting the contacting frequency of the carrier within a certain range.