The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 1992
Filed:
Aug. 20, 1991
Noriyuki Tanino, Itami, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
A semiconductor integrated circuit includes a field effect transistor on a dielectric substrate, a rear surface electrode on a rear surface of the dielectric substrate, a gate bias bonding pad for applying a bias to a gate of the field effect transistor, a current path between the pad and the gate impedance matched with the gate, and a via-hole connecting the source or the drain of the field effect transistor with the rear surface electrode. The current path and the rear surface electrode are electrically connected with each other by an auxiliary current path through a high resistance material that does not change the impedance at the gate. Thus, static electricity charging the gate bias bonding pad or a capacitor in the gate bias circuit during the fabrication process flows not through the gate of the FET but through the auxiliary current path, whereby the gate is protected from electrostatic breakdown.