The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 08, 1992

Filed:

Jul. 31, 1991
Applicant:
Inventors:

Karl Nufer, Steckborn, CH;

Lorenz Reber, Gaienhofen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D05C / ;
U.S. Cl.
CPC ...
1122661 ; 112439 ;
Abstract

Elementary patterns are sewn in a sewing machine wherein the work can be fed by increments T. The making of a pattern involves repeatedly moving the work in and counter to the feed direction between starting the final needle penetration points which are spaced apart a distance nT wherein n is a whole number exceeding one. This results in the making of several continuous thread legs each having a length nT which can exceed, at least slightly, the maximum bight range of the needle and each extending all the way between the starting and final penetration points. In order to form a second elementary pattern which intersects the first pattern, the work is fed to move the needle to an intermediate penetration point, for example, midway between the starting and final penetration points, and the work is then fed to position the needle at the starting penetration point of the second pattern. One or more stay stitches are formed at the starting and/or final penetration point of each elementary pattern in order to increase the amount of thread in the pattern and to reduce the likelihood of deformation of the work under the action of tensioned thread legs.


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