The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 1992
Filed:
Oct. 11, 1991
Applicant:
Inventors:
Juan R Maldonado, Chappaqua, NY (US);
Yuli Vladimirsky, Chappaqua, NY (US);
Assignee:
International Business Machines Corporation, Armok, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K / ;
U.S. Cl.
CPC ...
378 34 ; 378205 ;
Abstract
This is a process for aligning an x-ray lithography system including an x-ray mask and a work piece with an alignment mark. A zone plate lens is used in the x-ray mask. X-rays are directed through the zone plate lens to the alignment mark to detect when the lens is aligned with the mark by emission of photoelectrons generated by the work piece in response to the x-rays. The change of current when the x-ray beam crosses a feature on the alignment mark is detected by a properly biased zone plate or grating. The alignment mark can be an etched slot or a metal feature.