Charged particle beam projection aligner having position detector using

Abstract

A charged particle beam projection aligner comprising a particle beam source for irradiating a particle beam, a sectional shape forming device thereof, an electron lens and a deflector, a wafer mounted on a XY table and a vacuum column in which these devices are installed, further comprising an optical device which irradiates a light beam in the same direction as an irradiating direction of the particle beam, a detector for detecting a light beam reflected from alignment marks on the wafer by irradiating the light beam, and for detecting a reflected light beam and a reflected electron beam reflected from a fiducial mark on the XY table by irradiating the light beam and the particle beam, and a computer for memorizing lithographic patterns, correcting said lithographic patterns with signals from the detector and outputting the corrected lithographic patterns to the electron lens and the deflector so as to control them. Since the light beam is irradiated on the wafer in the same direction as the direction of the particle beam, an offset error of the pattern alignment is minimized.