The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 1992
Filed:
May. 20, 1991
John M Legare, Newark, DE (US);
Anestis L Logothetis, Wilmington, DE (US);
Duck J Yang, Wilmington, DE (US);
E. I. Du Pont de Nemours and Company, Wilmington, DE (US);
Abstract
Pellicles having films bearing at least one coating of perfluoropolymers as an antireflective surface, the perfluoropolymers comprising a low molecular weight perfluoropolymer having randomly copolymerized units of tetrafluoroethylene, perfluoro (alkyl vinyl) ether and a cure site monomer, the cure site monomer selected from the group consisting of vinylidene fluoride, perfluoro-(8-cyano-5-methyl-3,6-dioxa-1-octene), bromotetrafluorobutene or perfluoro (2-phenoxypropyl vinyl ether). Pellicles of this type are dust defocusing covers for photomasks and reticles used to project patterns onto light sensitive substrates such as photoresist-coated semiconductor wafers which are used in the manufacture of integrated circuits.