The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 1992
Filed:
Aug. 29, 1990
Applicant:
Inventors:
Akira Igarashi, Urawa, JP;
Chouji Fukuhara, Koganei, JP;
Soichi Takeshita, Kashima, JP;
Chikashi Nishino, Kashima, JP;
Masakazu Hanawa, Kashima, JP;
Assignee:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07C / ;
U.S. Cl.
CPC ...
252313 ;
Abstract
This invention is directed to an apparatus for producing reformed gas that achieves excellent thermal conductivity as well as compactness by the deposition of catalytic components on the surface of a reforming area side of a boundary member between a heating area and a heated reforming area. The deposition is carried out under mild conditions without being restricted by the materials, construction, gaps or spaces of the reformed gas-reaction portion in the apparatus. The invention also concerns a method for producing reformed gas by using this apparatus.