The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 1992
Filed:
May. 29, 1991
Lawrence K Wang, Latham, NY (US);
Lubomyr Kurylko, New Providence, NJ (US);
Mu H Wang, Latham, NY (US);
International Environmental Systems, Inc., Pittsfield, MA (US);
Abstract
An improved gas dissolving and releasing liquid treatment system involving the use of multi-stages gas dissolving pressure vessel and the use of a pressurized water release assembly and an open vessel is described. The gas dissolving and releasing liquid treatment system includes a liquid pressure pump, a pressure vessel, a gas injector, an inlet nozzle assembly, a gas compressor, gas regulators, gas flow meters, pressure gauges, a safety valve, a bleed-off point, feeders, pumps, a pressurized water release unit, a liquid flow meter, an open vessel, sludge removal means, and air emission control means. More than one gases introduced at different inlets are dissolved simultaneously and efficiently in the pressure vessel under controlled high pressure and high rotating velocity. The improved liquid treatment system is compact, simple and cost-effective, and is applied to ozonation, chlorination, recarbonation, oxygenation, bio-oxidation, nitrogenation, aeration, and flotation processes. Chemicals and/or microorganisms are dosed to the present invention to facilitate the required chemical and/or biochemical reactions for liquid treatment.