The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 1992
Filed:
Feb. 11, 1991
Edward G Rodgers, Palo Alto, CA (US);
Ottavio T Rotondale, Belmont, CA (US);
Xinix, Inc., Santa Clara, CA (US);
Abstract
A device for the optical measurement of light transmitted through silicon wafers and other media during the manufacture of electronic components and particularly during processing within a spray environment. The device is characterized by being a stationary assembly designed to provide structurally inherent optical alignment and focus. In addition the device is provided with a geometry specifically designed to direct any condensate flow away from the surface of the wafer, and with surface characteristics which minimize droplet separation from the surface of the device within a spray environment. The device is designed to permit its location out of the main spray pattern. The light source of the device is made as small as possible to minimize intrusion into the process environment.