The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 1992
Filed:
Sep. 05, 1989
Harald Cherdron, Wiesbaden-Naurod, DE;
Werner Prass, Mainz, DE;
Ude Scheunemann, Frankfurt am Main, DE;
Donald Lupo, Eppstein/Taunus, DE;
Hoechst Aktiengesellschaft, Frankfurt am Main, DE;
Abstract
Polyamides of the general formula [N(A)-X-N(B)-CO-Y-CO-].sub.n are described, in which Y denotes a divalent group, X a divalent radical whose chain contains at least two carbon atoms, A and B independently of one another denote H or a C.sub.1 to C.sub.26 alkyl group and n denotes an integer greater than 4. The said polyamides contain at least one alkyl group of C.sub.6 to C.sub.26 per repeating unit. The groups X and/or Y contain at leat one CH.sub.2 group in the chain. The polyamides are prepared by reaction of a diamine of the formula NHA-X-NHB with an about equimolar amount of a reactive derivative of a dicarboxylic acid of the formula COOH-Y-COOH. The polyamides obtained can be used in order to prepare highly ordered monomolecular LB films on a support. For this purpose, the polyamide is dissolved in a volatile organic solvent which is immiscible with water and the solution is spread on the water/air interface. After evaporation of the solvent the layer is compressed and transferred to a solid support by the LB technique. The film is very stable and can be used to prepare optical waveguide systems, filters for optical purposes or protective layers.