The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 1992
Filed:
May. 28, 1991
Applicant:
Inventor:
Theresa E Gentle, Midland, MI (US);
Assignee:
Dow Corning Corporation, Midland, MI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427575 ; 427 58 ; 4272553 ; 4272557 ; 427402 ; 427577 ; 427578 ;
Abstract
The present invention relates to the deposition of coatings containing silicon and oxygen from vaporized hydrogen silsesquioxane resin. The process comprises introducing the hydrogen silsesquioxane vapor into a deposition chamber containing the substrate to be coated and then inducing reaction of the vapor to form the coating.
Gentle, Theresa. (1992). Method of depositing a coating containing silicon and oxygen (U.S. Patent No. 5165955). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5165955
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile