The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 1992
Filed:
Nov. 29, 1991
Shane R Chilton, Scottsdale, AZ (US);
Mark D Griswold, Chandler, AZ (US);
Motorola, Inc., Schaumburg, IL (US);
Abstract
A method and apparatus is provided for removing metallic contamination from a fluid or liquid that passes through a recirculating system (10) that is used for cleaning and etching semiconductor wafers. A bath 11) and fluid is provided. A recirculared fluid flows through a silicon media, thereby removing the metallic contamination from the liquid. In a preferred embodiment, the silicon media is a plurality of silicon or polysilicon beads which provide a maximum surface area in a minimum of space. Additionally, removal of metallic contamination from the recirculating fluid is combined with particle filtration of the recirculating fluid single housing.