The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 1992
Filed:
Nov. 14, 1990
Applicant:
Inventors:
Assignee:
Yamaha Corporation, Hamamatsu, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C21D / ;
U.S. Cl.
CPC ...
148621 ; 148635 ; 148636 ;
Abstract
In composition of a Fe-Ni alloy used for television shadow masks and containing in, Co, Mn, Si and Cr as the major components, additional inclusion of Be assures high deformation resistance and easy pore formation via etching without impairing its inherent low thermal expansion. Introduction of annealing at 800.degree. to 1200.degree. C. temperature into production process sufficiently lowers proof stress of the product without causing any noticeable crystal coarseness. Increased mechanical strength enables production of a thin shadow mask material well suited for pore formation via etching, thereby assuring high grade screen display.