The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 17, 1992

Filed:

May. 22, 1991
Applicant:
Inventor:

Marvin E Monroe, Sunbury, OH (US);

Assignee:

Optek, Inc., Galena, OH (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B / ;
U.S. Cl.
CPC ...
134-1 ; 134 21 ; 156643 ;
Abstract

An apparatus is disclosed for abrading contaminants from the surface of a workpiece using plasma glow discharge. The workpieces are positioned in a low pressure chamber with an ionizable gas. A pair of spaced, conductive, interfacing panels form electrodes mounted within the chamber and defining a three-dimensional cleaning space between the electrodes. The electrodes are energized by a power supply, providing an alternating voltage at an ultrasonic frequency and the pressure is maintained to allow only abnormal glow discharge. After initiation of the abnormal glow discharge the electrode current is sensed to detect when to inject additional ionizable gas into the low pressure chamber.


Find Patent Forward Citations

Loading…