The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 1992
Filed:
Nov. 18, 1991
Jacob Y Wong, Santa Barbara, CA (US);
Gaztech International Corporation, Goleta, CA (US);
Abstract
A diffusion-type gas sample chamber for use in a gas analyzer consists of an elongated hollow tube having an inwardly-facing specularly-reflective surface that permits the tube to function also as a light pipe for transmitting radiation from a source to a detector through the sample gas. A number of filtering apertures in the wall of the otherwise non-porous hollow tube permit the sample gas to enter and exit freely under ambient pressure. Particles of smoke and dust of a size greater than 0.1 micron are kept out of the chamber by use of a semi-permeable membrane that spans the apertures in the hollow tube. Condensation of the sample gas components is prevented by heating the sample chamber electrically to a temperature above the dew point of the component of concern.