The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 1992
Filed:
Dec. 20, 1990
Applicant:
Inventors:
Johann W Bartha, Sindelfingen, DE;
Thomas Bayer, Singelfingen, DE;
Johann Greschner, Pliezhausen, DE;
Georg Kraus, Wildberg, DE;
Olaf Wolter, Aidlingen, DE;
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427577 ; 427249 ; 4272552 ; 427314 ;
Abstract
The present invention relates to a process for fabricating silicon carbide films and membranes with a predetermined stress via control of the deposition parameters which comprises the following steps:
Quick Actions:
Bartha, Johann. (1992). Process for fabricating silicon carbide films with a predetermined stress (U.S. Patent No. 5162133). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5162133
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