The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 1992
Filed:
Oct. 11, 1991
Applicant:
Inventors:
Gerhard Frind, Altamont, NY (US);
Sudhir D Savkar, Schenectady, NY (US);
Assignee:
General Electric Company, Schenectady, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B23K / ;
U.S. Cl.
CPC ...
21912147 ; 21912152 ; 21912151 ; 219 7616 ; 31511151 ;
Abstract
Apparatus and a method for generating an RF plasma plume wherein hydrogen gas is introduced downstream of the means for injecting plasma gas in order to increase the coupling between the RF coil and the plume and to decrease heat loss to the plasma containment walls.
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Frind, Gerhard. (1992). Apparatus for reducing plasma constriction by intermediate injection of (U.S. Patent No. 5159173). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5159173
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