The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 1992
Filed:
Feb. 21, 1991
Kiyoshi Okumura, Hitachi, JP;
Kazuhiko Nishimura, Hitachi, JP;
Minoru Fujimoto, Hitachi, JP;
Hiroo Ohkawa, Hitachi, JP;
Kazuo Mera, Hitachi, JP;
Shigeo Shiono, Hitachi, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A laser marking system of the present invention is provided with an irradiation position changing device on a laser beam path for changing the irradiation positions of the laser beam corresponding to each marking area when a marking area including a plurality of irradiation marking areas is formed by irradiating the workpiece with the pulse laser beam which has passed a pattern of a mask. The plurality of irradiation marking areas are successively irradiated with the pulse laser beam from an irradiation position to form a marking area. Since the marking area larger than each irradiation marking area can be obtained, the whole laser marking system can be made smaller in size without increasing the output power of the pulse laser generator.