The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 1992

Filed:

Jun. 26, 1991
Applicant:
Inventors:

Akihiro Kanakura, Osaka, JP;

Yoshio Eguchi, Osaka, JP;

Ryuzo Mizuguchi, Kyoto, JP;

Mitsuhiro Takarada, Gunma, JP;

Yoshio Okamura, Gunma, JP;

Hideyuki Itoh, Gunma, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
525474 ; 556419 ; 556425 ; 528 25 ; 528 27 ;
Abstract

The invention concerns a novel process for the preparation of poly(N-acylethyleneimine) grafted poysiloxanes comprising sulfoesterifying all or part of alcoholic hydroxyl groups of a hydroxy containing polysiloxane and conducting, in said sulfoesterification reaction mixture, ring-opening polymerization of a 2-oxazoline compound. The present process can afford the desired poly(N-acylethyleneimine) grafted polysiloxane in a higher reaction yield. The invention also provides novel poly(N-acylethyleneimine) grafted polysiloxanes.


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