The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 1992
Filed:
Mar. 20, 1989
Applicant:
Inventors:
Helen C Leong, Atherton, CA (US);
Martin Katz, Menlo Park, CA (US);
Chung-Heng Cheng, San Jose, CA (US);
Assignee:
Advanced Polymer Systems, Inc., Redwood City, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A01N / ; A01N / ; A61L / ; B32B / ;
U.S. Cl.
CPC ...
424411 ; 424400 ; 424401 ; 424402 ; 424403 ; 424404 ; 424405 ; 424409 ; 424414 ; 424416 ; 424501 ; 424502 ; 424 59 ; 424 763 ; 514963 ; 514965 ; 428241 ; 428243 ; 428281 ; 428905 ; 428907 ; 428911 ; 428913 ;
Abstract
Intersticed materials, including woven and nonwoven fabrics, open-cellular materials and the like, are impregnated with functional substances by incorporating the substances in microscopic porous particles in which the pores form an interconnected network open to the particles in the interstices of the materials. The functional substances thus impart useful properties to the material in a controlled release manner.